Advanced Plasma Technology
(Sprache: Englisch)
Here, internationally renowned scientists discuss the latest results in plasma technology. Divided into one main sectionson fundamental and one on application technology. Indispensable for physicists, chemists and engineers interested in recent developments in the field.
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Here, internationally renowned scientists discuss the latest results in plasma technology. Divided into one main sectionson fundamental and one on application technology. Indispensable for physicists, chemists and engineers interested in recent developments in the field.
Klappentext zu „Advanced Plasma Technology “
Edited and compiled by scientists with a global reputation in plasma research, this monograph compiles contributions on the latest results in plasma technology. Divided into two main sections, the firston fundamental technology includes plasma production and control, high-pressure discharges, modeling and simulation, diagnostics, dust control, and etching. The section on application technology deals with polymer treatments, silicon solar cell, coating and spray, biomaterials, sterilization and waste treatment, plasma propulsion, plasma display panel, and anti-corrosion coatings.The result is an indispensable work for physicists, chemists and engineers interested in the recent developments in their field.
Inhaltsverzeichnis zu „Advanced Plasma Technology “
Basic Approaches to Plasma Production and ControlN. SatoPlasma Sources and Reactor ConfigurationsP. ColpoSimulations for Low-Temperature Plasma ApplicationsJ. K. LeeModeling and diagnostics of He discharges for treatment of polymersD. Mataras3-D Modelling of Thermal Plasmas (RF and Transferred Arc) for the Design of Sources and Industrial ProcessesE. GhediniRF Plasma Sources for Semiconductor processingF. F. ChenAdvanced Plasma Diagnostics for Thin Film DepositionR. EngelnPlasma Processing of Polymers by a Low-Frequency Discharge with Asymmetrical Configuration of ElectrodesF. Arefi-Khonsari and M. TatoulianFundamentals on plasma deposition of fluorocarbon filmsA. MilellaPlasma CVD processes for thin film Si solar cellsA. MatsudaVHF Plasma Production for Solar CellsY. KawaiGrowth Control of Clusters in Reactive Plasmas and Its Application to High-stability a-Si Film DepositionY. WatanabeMicro- and Nano-Structuring in Plasma-Processes for Biomaterials: Micro- and Nano-Features as Powerful Tools to Address Selective Biological ResponsesE. SardellaChemical Immobilization of Biomolecules on Plasma Modified Substrates for Biomedical ApplicationsL. C. LopezIn Vitro Methods to Assess the Biocompatibility of Plasma Modified SurfacesM. NardulliCold gas plasma in biology and medicineE. StoffelsMechanisms of Sterilization and Decontamination of Surfaces by Low Pressure PlasmaF. RossiApplication to Atmospheric Pressure Glow PlasmaM. KogomaHydrocarbon and fluorocarbon thin films deposition in atmospheric pressure glow dielectric barrier dischargesF. FanelliRemark on Production of Atmospheric Pressure Non-Thermal Plasmas for Modern ApplicationR. ItataniPresent status and Future of Color Plasma DisplayT. ShinodaCharacteristics of PDP PlasmasH. IkegamiRecent progress in plasma spray processingT. YoshidaElectrohydraulic Discharge Direct Plasma Water Treatment ProcessesJ.-S. ChangDevelopment and Physics Issues of an Advanced Space PropulsionM. Inutake
Autoren-Porträt
Professor Riccardo d'Agostino is director of the Department of Chemistry at the University of Bari, Italy. His research is focused on low pressure plasma processes and diagnostics for the modification of materials. During is career, he authored 180 scientific papers and edited four books and three international proceedings. His memberships include the managing committee of Plasma Science Technique Division of IUVSTA and, as chairman, the IUPAC Committee on "Plasma Chemistry" (1989-1991). He served as co-editor of the journal Plasmas and Polymers (until 2003) and chaired numerous international conferences.Professor Pietro Favia is Associate Professor of Chemistry and Chemistry of Materials at the Department of Chemistry, University of Bari, Italy. During his career he focused on low pressure plasma processes, plasma diagnostics and surface characterization techniques. He authored about 100 papers, acted as editor of two books and served in many organizing and scientific committees of renowned international conferences on Plasma Chemistry.
Professors Favia and d'Agostino are the two editors in chief of the journal Plasma Processes and Polymers (PPP).
The co-editors, Professors Farzaneh Arefi-Konsari, Yoshinobu Kawai, Noriyoshi Sato, Hideo Ikegami, are also experienced plasma researchers. They are responsible for sub-areas within the monograph, on which they have concentrated in their respective careers.
Bibliographische Angaben
- 2007, XXII, 457 Seiten, 256 Schwarz-Weiß-Abbildungen, Maße: 17,7 x 24,9 cm, Gebunden, Englisch
- Herausgegeben: Riccardo D'Agostino, Pietro Favia, Yoshinobu Kawai
- Verlag: Wiley-VCH
- ISBN-10: 3527405917
- ISBN-13: 9783527405916
- Erscheinungsdatum: 12.12.2007
Sprache:
Englisch
Rezension zu „Advanced Plasma Technology “
"this book is worth reading for the ambitious graduate student and very interesting for the specialist in academia and industry who intends to revamp his know-how." ( Plasma Process. Polym . 2008, 5)
Pressezitat
"this book is worth reading for the ambitious graduate student and very interesting for the specialist in academia and industry who intends to revamp his know-how." ( Plasma Process. Polym . 2008, 5)
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